| Autor: |
Herbert Buschbeck, Hans-Joachim Döring, Olaf Fortagne, Gertraud Lammer, Christoph Brandstatter, Gerhard Stengl, Thomas Elster, Elmar Platzgummer, Hans Loeschner |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
Recent studies have shown the feasibility of Projection Mask-Less Lithography (PML2) for small and medium volume device production (2-5 WPH) for the 45nm technology node. This PML2 tool concept comprises a combined electrostatic-magnetic electron optical column with 200x de-magnification factor. Instead of a mask there is a programmable aperture plate enabling dynamic beam structuring. Wafer exposure is done stripe-by-stripe with a scanning 300mm wafer stage. Detailed calculations of the PML2 optical column (2-step demagnification) including Monte-Carlo simulations of Coulomb interactions are presented. The extendibility of PML2 technology for the 32nm node will be discussed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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