Plasma erosion behavior of yttrium oxide film formed by aerosol deposition method
| Autor: | Hiroaki Ashizawa, Masakatsu Kiyohara |
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| Rok vydání: | 2016 |
| Zdroj: | 2016 International Symposium on Semiconductor Manufacturing (ISSM). |
| DOI: | 10.1109/issm.2016.7934526 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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