Subwavelength imaging of self-assembled triangular array through a silver superlens
| Autor: | Xiaowei Guo, Jia Liu, Qiming Dong, Wei Xia, Zhiyou Zhang, Shouqiang Zhang |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Diffraction
Materials science Superlens business.industry Resolution (electron density) Photoresist Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Wavelength Optics Nanolithography Electrical and Electronic Engineering business Nanoscopic scale Triangular array |
| Zdroj: | Microelectronic Engineering. 123:28-32 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2014.03.038 |
| Popis: | Graphical abstractDisplay Omitted We explore subwavelength imaging of the isolated triangular nanostructures.We use a modified self-assembly method to fabricate triangular array mask.The superlens structure provides an enhanced imaging resolution. Superlens nanolithography is a promising technique for patterning nanoscale structures because of its ability to overcome the diffraction limit. In this paper, subwavelength imaging of triangular particle array through a silver superlens is investigated. The superlens structure was optimized by means of the transfer transmission matrix method. The triangular array was obtained by self-assembly of nanoscale polystyrene spheres (PSS) and was successfully replicated into the photoresist. Experimental results show that the superlens structure provides at least 50nm resolution, about 1/7 of the incidence wavelength. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect