Photo-Sensitive RAFT-Agents for Advanced Microparticle Design

Autor: Michael Kaupp, Martina H. Stenzel, Thomas Tischer, Christopher Barner-Kowollik, Thorsten Hofe, Vanessa Trouillet, Astrid F. Hirschbiel, Udo Geckle, Andrew P. Vogt
Rok vydání: 2013
Předmět:
Zdroj: Macromolecules. 46:6858-6872
ISSN: 1520-5835
0024-9297
DOI: 10.1021/ma401242g
Popis: The current contribution describes the combination of an efficient reversible deactivation radical polymerization process (reversible addition–fragmentation chain transfer (RAFT) polymerization) with a mild light-induced modular ligation technique. A novel RAFT-agent was synthesized which carries a photoactive group based on ortho-quinodimethane (photo-enol) chemistry. The novel photoreactive RAFT-agent controls the polymerization of a wide range of monomers such as styrene, N,N-dimethylacrylamide and a protected glycomonomer (2-(2′,3′,4′,6′-tetra-O-acetyl-β-d-mannosyloxy)ethyl acrylate) with dispersities between 1.07 and 1.17 (3500 g·mol–1 ≤ Mn ≤ 10100 g·mol–1) and quantitative end-group functionalization. The photo-enol group reacts with dieneophiles under mild irradiation (λmax = 320 nm) at ambient conditions – so that the RAFT-group remains intact – and without any catalyst to form block copolymers in a matter of minutes. Furthermore, the RAFT-polymers can be photografted onto porous polymeric (poly(g...
Databáze: OpenAIRE