Thin film growth rate effects for primary ion beam deposited diamondlike carbon films

Autor:	Michael J. Mirtich, Dan Nir
Rok vydání:	1986
Předmět:	Materials science Ion beam Analytical chemistry Surfaces and Interfaces Chemical vapor deposition Sputter deposition Condensed Matter Physics Ion source Surfaces Coatings and Films Ion beam deposition Carbon film Physics::Plasma Physics Deposition (phase transition) Thin film
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:560-563
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.573886
Popis:	Diamondlike carbon (DLC) films were grown by primary ion beam deposition and the growth rates were measured for various beam energies, types of hydrocarbon gases and their ratio to Ar, and substrate materials. The growth rate had a linear dependence upon hydrocarbon content in the discharge chamber, and only small dependence on other parameters. For given deposition conditions a threshold in the atomic ratio of carbon to argon gas was identified below which films did not grow on fused silica substrate, but grew on Si substrate and on existing DLC films. Ion source deposition parameters and substrate material were found to affect the deposition threshold and film growth rates.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::7b101698b2b129ccc14a1793f527810f https://doi.org/10.1116/1.573886 Zobrazit plný text záznamu