A qualitative and quantitative study of the oxides of aluminum and silicon using AES and XPS
| Autor: | David Lichtman, J.A. Kovacich |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Aluminium oxides
Radiation Silicon Binding energy Analytical chemistry chemistry.chemical_element Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Auger chemistry X-ray photoelectron spectroscopy Aluminosilicate Aluminium Physical and Theoretical Chemistry Silicon oxide Spectroscopy |
| Zdroj: | Journal of Electron Spectroscopy and Related Phenomena. 35:7-18 |
| ISSN: | 0368-2048 |
| DOI: | 10.1016/0368-2048(85)80038-4 |
| Popis: | Experimental AES and XPS results from powdered α-Al2O3, SiO2, Al2Si2O7·2H2O and an aluminosilicate glass are presented. The AES kinetic energy and the XPS binding energy values of core-level states and the peak shapes of X-ray induced O KLL Auger transitions are presented as qualitative reference data for the purpose of aiding in the identification of unknown aluminum oxide/silicon oxide samples. The AES peak-to-peak heights and the XPS peak areas of core-level states are presented as quantitative data and are used in the calculation of empirical relative sensitivity factor values. In addition, the sensitivity factor values are given parameters according to a single variable, f8, defined as the ratio of the volume density of the oxygen atoms to the sum of the volume densities of the aluminum and silicon atoms. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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