Finely tunable laser based on a bulk silicon wafer for gas sensing applications
| Autor: | Jose L. Cruz, Everardo Vargas-Rodriguez, E. Gallegos-Arellano, R. K. Raja-Ibrahim, A. D. Guzman-Chavez, M. Cano-Contreras |
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| Rok vydání: | 2016 |
| Předmět: |
Range (particle radiation)
Materials science Physics and Astronomy (miscellaneous) Hybrid silicon laser business.industry chemistry.chemical_element 02 engineering and technology Laser 01 natural sciences law.invention 010309 optics Erbium Wavelength 020210 optoelectronics & photonics Optics chemistry law 0103 physical sciences 0202 electrical engineering electronic engineering information engineering Wafer business Instrumentation Fabry–Pérot interferometer Tunable laser |
| Zdroj: | Laser Physics Letters. 13:065102 |
| ISSN: | 1612-202X 1612-2011 |
| DOI: | 10.1088/1612-2011/13/6/065102 |
| Popis: | In this work a very simple continuously tunable laser based on an erbium ring cavity and a silicon wafer is presented. This laser can be tuned with very fine steps, which is a compulsory characteristic for gas sensing applications. Moreover the laser is free of mode hopping within a spectral range sufficiently wide to match one of the ro-vibrational lines of a target molecule. Here the proposed laser reached, at ∼1530 nm, a continuous tuning range of around 950 pm (>100 GHz) before mode hopping occurred, when a silicon wafer of 355 μm thickness was used. Additionally, the laser can be finely tuned with small tuning steps of |
| Databáze: | OpenAIRE |
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