Transient effects in PD SOI MOSFETs and potential DRAM applications

Autor: Mikhail Nagoga, P. Fazan, Kristin De Meyer, Jean-Michel Sallese, Sorin Cristoloveanu, Serguei Okhonin, Hans Van Meer, J. Pontcharra, O. Faynot
Rok vydání: 2002
Předmět:
Zdroj: Solid-State Electronics. 46:1709-1713
ISSN: 0038-1101
DOI: 10.1016/s0038-1101(02)00148-x
Popis: The transients in partially depleted (PD) silicon on insulator (SOI) MOSFETs produced with 0.25 and 0.13 μm technologies are studied. The exponential dependence of the switch-on transient time on the reciprocal drain voltage for both P- and N-channel devices is explained by the predominance of the impact ionisation mechanism. A pulse method to measure output I – V curves using short gate pulses has been applied to study self-heating and transient effects in 0.13 μm SOI N-MOSFETs. It is shown that under normal operating conditions the difference between DC and pulsed I – V curves of PD SOI MOSFET is attributed mainly to the floating body effect and not to self-heating. We demonstrate also that it is possible to use the body charging of PD SOI devices to store information. Based on this effect, an original 1T-DRAM cell concept is proposed (DRAM: dynamic random access memory). This cell is at least two times smaller in area than the conventional 1T/1C DRAM cell and does not require the integration of a storage capacitor. This concept allows the manufacture of low cost DRAMs and embedded DRAMs for 100 and sub-100 nm generations.
Databáze: OpenAIRE