Characterization of some trimethyl(organylamino)silanes—precursors for preparation of silicon carbonitride films
| Autor: | I. P. Tsirendorzhieva, M. G. Voronkov, V. I. Rakhlin, L. D. Nikulina, Marina Kosinova, Sergey V. Sysoev |
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| Rok vydání: | 2010 |
| Předmět: |
chemistry.chemical_classification
Silanes Silicon Vapor pressure Carboxylic acid Inorganic chemistry technology industry and agriculture food and beverages chemistry.chemical_element Chemical vapor deposition Atmospheric temperature range Condensed Matter Physics chemistry.chemical_compound chemistry Yield (chemistry) Vaporization Materials Chemistry Ceramics and Composites |
| Zdroj: | Glass Physics and Chemistry. 36:376-381 |
| ISSN: | 1608-313X 1087-6596 |
| Popis: | A series of aminosilanes has been synthesized by the reaction of carboxylic acid di(organyl)amides with trimethyliodsilane. A purification method providing an increase in the yield of end products to 82% has been developed. The identity of the products has been confirmed using an elemental analysis and IR, UV, and 1H NMR spectroscopy. The spectral characteristics of the synthesized aminosilanes have been determined. The temperature dependences of the saturated vapor pressure have been established, and the thermodynamic characteristics of the vaporization processes have been calculated. It has been demonstrated that the aminosilanes Me3SiNEt2, Me3SiNHAll, and Me3SiNHPh are heat resistant in the temperature range 296–452 K and have a vapor pressure sufficient for their use in the processes of chemical vapor deposition of a substance, so that they can be recommended as precursors for synthesis of silicon carbonitride films. |
| Databáze: | OpenAIRE |
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