Ceramic PVD Coatings as Dense/Thin Barrier Layers on Interconnect Components for SOFC Applications

Autor:	Georg Kunschert, Georg Strauss, Stefan Schlichtherle, Karl Kailer
Rok vydání:	2007
Předmět:	Interconnection Materials science Diffusion barrier Alloy engineering.material Conductivity visual_art visual_art.visual_art_medium engineering Ceramic Composite material Thin film Porosity Perovskite (structure)
Zdroj:	ECS Transactions. 7:2407-2416
ISSN:	1938-6737 1938-5862
Popis:	In the last decade of SOFC metallic interconnect component development barrier coatings have proven being indispensable as functional layers and therefore gained serious attention. Diffusion processes at the interface between metallic and other cell materials have demonstrated harmful influence on degradation of SOFC stacks. Recent scientific developments of perovskite barrier layers show that innovative pulsed PVD technologies make it feasible to deposit thin films of highest density and conductivity. Simultaneously, through applying PVD methods it is possible to drastically reduce the employed perovskite material. PVD coatings in the thickness range of around 1 µm have been applied on porous substrates of Plansee's P/M ODS ferritic FeCr- alloy ITM for MSC type SOFC as well as on bulk components. Long term oxidation tests at 850{degree sign}C in combination with SEM/EPMA imaging and element sensitive mappings are shown and verify the functionality of described coatings as diffusion barrier layers.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::79151837babeb53f9175ccf01fd18931 https://doi.org/10.1149/1.2729363 Zobrazit plný text záznamu