Direct-write deposition with a focused electron beam
| Autor: | W. Brezna, S. Müller, M. Fischer, M. Schramboeck, Heinz D. Wanzenboeck, Emmerich Bertagnolli, J. Gottsbachner |
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| Rok vydání: | 2006 |
| Předmět: |
Fabrication
business.industry Chemistry technology industry and agriculture Analytical chemistry Chemical vapor deposition Condensed Matter Physics Electron beam physical vapor deposition Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Pulsed laser deposition Optoelectronics Electrical and Electronic Engineering Thin film Electron beam-induced deposition business Silicon oxide Deposition (law) |
| Zdroj: | Microelectronic Engineering. 83:784-787 |
| ISSN: | 0167-9317 |
| Popis: | The fabrication of nanostructured dielectrics of high purity produced by electron beam induced deposition (EBID) was investigated. Additionally, the process parameters were optimized towards high deposition rate. Silicon oxide was chosen as exemplary dielectric. The deposition was performed with an electron microscope with a self-designed nozzle system. An organo-silicon precursor was used to deposit silicon oxide. The increase of the oxygen content and the reduction of carbon contaminations of the depositions were preformed by adding molecular oxygen. Patterns of large areas as well as nm-scale arrays were fabricated. To optimize the deposition rate the correlation between beam parameters and deposition rate was studied. It has been shown that this direct-write method allows obtaining arbitrary structures with superior material quality. |
| Databáze: | OpenAIRE |
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