| Popis: |
Defect types for chrome photomask blanks are defined. Their probable causes and effects on device yield are explained. Three systems are presented which can detect pinholes, surface defects, or both. Repeatability and detection probability of pinholes and surface defects are demonstrated for the Coberly Plate Inspector 714, which inspects for both types simultaneously. Raw material quality, in defects or pinholes per unit area, is correlated to finished photomask quality as defined by KLA-101 inspection. Through raw material inspection it is possible to predict and improve mask quality and yield.© (1983) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only. |
