Photo-structurable polymer for interlayer single-mode waveguide fabrication by femtosecond laser writing
| Autor: | K. Pfeiffer, Uwe Hollenbach, Ho Hoai Duc Nguyen, Stefan Hengsbach, Ute Ostrzinski, Stefan Pfirrmann, Juergen Mohr |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Fabrication Stacking 02 engineering and technology Refractive index profile 01 natural sciences law.invention 010309 optics Inorganic Chemistry Optics law 0103 physical sciences Surface roughness Electrical and Electronic Engineering Physical and Theoretical Chemistry Spectroscopy High-refractive-index polymer business.industry Organic Chemistry 021001 nanoscience & nanotechnology Laser Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Photopolymer Femtosecond 0210 nano-technology business |
| Zdroj: | Optical Materials. 66:110-116 |
| ISSN: | 0925-3467 |
| Popis: | We present the fabrication and characterization of inter-layer single-mode light-guiding structures in a newly developed photo-structurable polymer via femtosecond laser writing. A host-guest polymer system utilizing external diffusion induces permanent and high refractive index modulation. Analyzing the complete curing and the impact of external diffusion on refractive index profile helps optimize the fabrication process. The fabrications of 4 × 2 array interconnect and 3-waveguide core fan-out device involve only a single layer, and need no stacking or alignment effort. The resulting pitch size and crosstalk between single-mode waveguides are 25 μm and −34 dB, respectively. Adding sensitizer into the photopolymer to increase its sensitivity in two-photon polymerization at a writing wavelength of 390 nm reduces the surface roughness of written structures by a factor of seven. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect