| Autor: |
H. Oulfajrite, Jérôme Guillot, Sylvie Bourgeois, F. Fabreguette, Alexis Steinbrunn, A. Jouaiti, L. Lâallam, M. Boulghallat |
| Rok vydání: |
2003 |
| Předmět: |
|
| Zdroj: |
Journal of Chemical Research. 2003:786-788 |
| ISSN: |
1747-5198 |
| DOI: |
10.3184/030823403322840396 |
| Popis: |
Titanium oxinitride thin film with a thickness equal to 250 nm is obtained at 700 °C by the LP-MOCVD method. Analysis by photoelectron spectroscopy and by X-ray diffraction show that the composition of the deposit is TiN 0 . 8 O 0 . 4 with a TiN structure. Morphological observation of the deposit, studied by scanning electron microscopy, indicated that the surface is rough with the presence of some fissures. Electrochemical study of samples in Ringer's solution (9g/l of NaCI) at 37°C, showed the role played by the surface state and imperfections on the corrosion acceleration. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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