Thin‐film formation
| Autor: | Werner Kern, John L. Vossen |
|---|---|
| Rok vydání: | 1980 |
| Předmět: | |
| Zdroj: | Physics Today. 33:26-33 |
| ISSN: | 1945-0699 0031-9228 |
| DOI: | 10.1063/1.2914077 |
| Popis: | The enormous number of successful applications of thin films for a large variety of scientific, engineering and industrial purposes is in large measure due to the rapidly increasing scientific understanding of the nature of the processes used to deposit thin films. Remarkable advances have been made, especially over the last decade, both in the understanding of older processes and in the development of new ones to satisfy new, and ever more sophisticated, needs. This special issue of PHYSICS TODAY includes representative articles on thin‐film processes, analytic techniques and applications. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|