The growth of thin films with high thickness uniformity using ultrahigh vacuum molecular beam deposition
| Autor: | J. S. Orr, A. C. Walker, C. C. H. Hale, K. A. Prior, Jinesh Mathew, S. D. Smith, I. T. Muirhead, S. P. Fisher |
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| Rok vydání: | 1990 |
| Předmět: |
chemistry.chemical_classification
Materials science business.industry Mineralogy Crystal growth Surfaces and Interfaces Dielectric Condensed Matter Physics Surfaces Coatings and Films Interferometry Optical coating chemistry Homogeneity (physics) Optoelectronics Thin film business Inorganic compound Molecular beam epitaxy |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:3934-3937 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.576424 |
| Popis: | Micrometer thick layers of ZnSe and other dielectric materials have been grown with high thickness uniformity using the new ultrahigh vacuum (UHV) molecular beam deposition (MBD) technique. Optical techniques have been employed to demonstrate that variations in thickness down to as little as ±0.15% over 90 mm diam can be achieved. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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