The Dislocation Bias
Autor: | W. G. Wolfer |
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Rok vydání: | 2007 |
Předmět: |
Materials science
Condensed matter physics business.industry Nucleation chemistry.chemical_element Microstructure Crystallographic defect Computer Science Applications Condensed Matter::Materials Science Optics Computational Theory and Mathematics chemistry Cavitation General Materials Science Diffusion (business) Dislocation business Helium |
Zdroj: | Journal of Computer-Aided Materials Design. 14:403-417 |
ISSN: | 1573-4900 0928-1045 |
DOI: | 10.1007/s10820-007-9051-3 |
Popis: | Bias factors for dislocations quantify the preferential diffusion of self-interstitials relative to the diffusion of vacancies to dislocations. These parameters are essential for rate theory computer codes that model nucleation and growth of voids, helium bubbles, dislocation loops, and the evolution of microstructures in materials subject to high dose irradiations. Compact formulae for these factors are derived and the accuracy of several approximations is explored. |
Databáze: | OpenAIRE |
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