Preliminary experience of optical elements fabrication by X-ray lithography

Autor:	V. P. Koronkevich, E.G Churin, O.A Makarov, V.P. Nazmov, L.A Mezentseva, Valery F. Pindyurin, G.N. Kulipanov
Rok vydání:	1995
Předmět:	Physics Nuclear and High Energy Physics business.industry Extreme ultraviolet lithography law.invention Optics Resist law Multiple patterning Optoelectronics X-ray lithography Photolithography business Instrumentation Lithography Next-generation lithography Maskless lithography
Zdroj:	Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 359:412-414
ISSN:	0168-9002
DOI:	10.1016/0168-9002(94)01668-2
Popis:	X-ray lithography using synchrotron radiation from the VEPP-3 storage ring was applied for the fabrication of test specimens of some optical elements such as Fresnel lenses and arrays of optical elements for visible light. A promising advantage of the application of X-ray lithography is the possibility of micron scale patterning on curved surfaces. The patterns of Fresnel-like structures were generated by an annular laser photoplotter for the fabrication of an X-ray mask on a 2-μm-thick silicon membrane with a 1.5-μm-thick gold absorber. The X-ray lithography station at the VEPP-3 storage ring was used for deep X-ray lithography.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::779bbb883131bc57f8342065c075c53a https://doi.org/10.1016/0168-9002(94)01668-2 Zobrazit plný text záznamu Full Text from ScienceDirect