Maintaining the localized surface plasmon resonance of copper nanoparticles by defective TiO2 thin films

Autor:	Yingcui Fang, Zhitao Cheng, Shiqi Zhao, Hongliang Hao, Shuai Wang
Rok vydání:	2021
Předmět:	Materials science chemistry Annealing (metallurgy) Nanoparticle chemistry.chemical_element General Materials Science Nanotechnology General Chemistry Surface plasmon resonance Thin film Copper Deposition (law)
Zdroj:	Applied Physics A. 127
ISSN:	1432-0630 0947-8396
DOI:	10.1007/s00339-021-05073-9
Popis:	The localized surface plasmon resonance (LSPR) of copper nanoparticles (CuNPs) damps quickly in air due to the easy oxidation of copper atoms. Finding ways to retard the oxidation of CuNPs is critical for the applications based on the LSPR of CuNPs. In this paper, we report on a new method to maintaining the LSPR of CuNPs by deposition of CuNPs on TiO2 thin films in vacuum followed by annealing in nitrogen ambient. The anti-oxidation properties of the CuNPs were improved greatly. In three days, the LSPR intensities at 532 and 633 nm were reduced by only 40 and 32%, respectively. This method is simple and cost-effective.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::779b48b751a10c27588a7e03dfa04d9a https://doi.org/10.1007/s00339-021-05073-9 Zobrazit plný text záznamu Full text from SpringerLink