Inelastic Low-Energy Electron Diffraction Measurements on Al (111)
| Autor: | J. O. Porteus, W. N. Faith |
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| Rok vydání: | 1972 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science and Technology. 9:1062-1072 |
| ISSN: | 0022-5355 |
| DOI: | 10.1116/1.1316991 |
| Popis: | An experimental study has been made of electrons in the energy range 40–80 eV, inelastically scattered and diffracted from a clean Al(111) surface. The surface is prepared by epitaxial vapor deposition on a Si(111) single-crystal surface in ultrahigh vacuum immediately preceding the measurements. The inelastic electron intensity at a given energy loss and angle is obtained as the energy derivative of the amplified electron current from a Faraday collector having a retarding field analyzer and limited angular acceptance. The energy derivative comes from the digitally computed average of a repeatedly measured difference in dc signal accompanying a fixed increment in retarding field. Using this method inelastic angular and loss profiles at 15° incidence have been obtained in the vicinity of a Bragg maximum of the 00 elastic beam. The profiles show structure related to the surface and volume plasmon momenta by a two-step model of inelastic diffraction. Dispersion data inferred by applying this model to the “l... |
| Databáze: | OpenAIRE |
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