Effect of Magnetic Field on NiCu Electrodeposition from Citrate Plating Solution and Characterization of Deposit

Autor: Ming Sun, Vladyslav Alexandrovich Vas'ko, Ibro Tabakovic, Steve Riemer, Mark T. Kief
Rok vydání: 2005
Předmět:
Zdroj: Journal of The Electrochemical Society. 152:C851
ISSN: 0013-4651
Popis: The effect of an external in-plane magnetic field (B = 0.1 T) on the electrodeposition of NiCu films from a citrate bath solution was studied. The application of the magnetic field showed the following effects: (i) an increase of limiting current for Cu 2 + reduction, (ii) an increase of plating rate of NiCu by ∼17%, (iii) an increase of Cu content in NiCu deposit of 4.9%, (iv) a decrease of tensile stress on NiCu films, (v) a strong influence on the texture, and (vi) a strong influence on surface morphology resulting in three-dimensional (3D) growth without applied magnetic field and 2D growth with applied magnetic field.
Databáze: OpenAIRE