In-line Process Monitoring for Amorphous Oxide Semiconductor TFT Fabrication using Microwave-detected Photoconductivity Decay Technique

Autor:	Yasuyuki Takanashi, Tomoya Kishi, Shinya Morita, Aya Hino, Hiroshi Goto, Toshihiro Kugimiya, Kazushi Hayashi, Hiroaki Tao, Mototaka Ochi
Rok vydání:	2014
Předmět:	Materials science Fabrication business.industry Photoconductivity Oxide thin-film transistor Electronic Optical and Magnetic Materials Amorphous solid Sputtering Thin-film transistor Optoelectronics Electrical and Electronic Engineering Thin film business Microwave
Zdroj:	IEICE Transactions on Electronics. :1055-1062
ISSN:	1745-1353 0916-8524
DOI:	10.1587/transele.e97.c.1055
Popis:	SUMMARY We have investigated the microwave-detected photoconductivity responses from the amorphous In–Ga–Zn–O (a-IGZO) thin films. The time constant extracted by the slope of the slow part of the reflectivity signals are correlated with TFT performances. We have evaluated the influences of the sputtering conditions on the quality of a-IGZO thin film, as well as the influences of gate insulation films and annealing conditions, by comparing the TFT characteristics with the microwave photoconductivity decay ( -PCD). It is concluded that the -PCD is a promising method for in-line process monitoring for the IGZO-TFTs fabrication.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::76a1e4e1715ee2c1428def69c85f1d98 https://doi.org/10.1587/transele.e97.c.1055 Zobrazit plný text záznamu