Structure, composition and pitting behavior of sputtered Al, Al&.zbnd;Cr and Al&.zbnd;Ta films
| Autor: | R. B. Inturi, Z. Szklarska-Smialowska |
|---|---|
| Rok vydání: | 1993 |
| Předmět: |
Materials science
General Chemical Engineering Metallurgy Alloy Analytical chemistry chemistry.chemical_element General Chemistry engineering.material Chloride Grain size chemistry Sputtering Aluminium Pitting corrosion medicine engineering General Materials Science Thin film Deposition (law) medicine.drug |
| Zdroj: | Corrosion Science. 34:1201-1212 |
| ISSN: | 0010-938X |
| DOI: | 10.1016/0010-938x(93)90081-q |
| Popis: | Single phase Al&.zbnd;Cr (4 at% and 9 at% Cr) and predominantly single phase Al&.zbnd;Ta (10 at% and 17 at% Ta) alloy films were prepared by sputtering the corresponding alloy composite targets. The deposition procedure used in this study yielded homogeneous and fine crystalline structures (grain size < 40 nm). These alloy films exhibit superior pitting resistance compared to bulk Al in chloride solutions. The dependence of the pitting potential of Al alloys on the nature of the alloying element is discussed. |
| Databáze: | OpenAIRE |
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