Polishing Mechanism of Glass Substrates with its Processing Characteristics by Cerium Oxide and Manganese Oxide Slurries

Autor: Yoshitsugu Kawase, Tsutomu Yamazaki, Yasuhide Yamaguchi, S. Isayama, Yoji Matsukawa, Syuhei Kurokawa, Yoji Umezaki, Yoichi Akagami, Hiroyuki Kono, Toshiro Doi
Rok vydání: 2010
Předmět:
Zdroj: Key Engineering Materials. :141-145
ISSN: 1662-9795
DOI: 10.4028/www.scientific.net/kem.447-448.141
Popis: With an aim to reduce the consumption of cerium oxide (CeO2) used in large quantity for the polishing of glass substrates applied for HDD and display, we have attempted to obtain the processing characteristics of glass substrates by CeO2 slurry. We also paid attention to manganese oxide abrasives to replace cerium oxide abrasives. As a result, we have found Mn2O3 abrasives potential to replace disappearing CeO2 for the polishing of glass substrates.
Databáze: OpenAIRE