Pulsed Laser Deposition of C60 Thin Films with Atomically Smooth Surface
| Autor: | Kenichi Horiguchi, Toshiaki Asakawa, Hideomi Koinuma, Mamoru Yoshimoto, Takashi Arakane, Kiyoto Hirai |
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| Rok vydání: | 1993 |
| Předmět: |
Laser ablation
Materials science Excimer laser Physics::Instrumentation and Detectors medicine.medical_treatment Physics::Medical Physics General Engineering Analytical chemistry General Physics and Astronomy Substrate (electronics) Laser Pulsed laser deposition law.invention Condensed Matter::Materials Science symbols.namesake law Condensed Matter::Superconductivity symbols medicine Physics::Atomic Physics Thin film Raman spectroscopy Raman scattering |
| Zdroj: | Japanese Journal of Applied Physics. 32:L1081 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.1143/jjap.32.l1081 |
| Popis: | Pulsed laser deposition was found to be a novel method for the fabrication of high-quality C60 thin films with extremely smooth surfaces. The irradiation of a pulsed KrF excimer laser beam onto a C60 powder target induced the formation of a plasma plume when the laser energy fluence was 40 mJ/cm2 and higher. The ablated species were condensed onto a substrate in the form of thin film. Thin films deposited at laser energy fluences in the narrow range between 40 mJ/cm2 and 50 mJ/cm2 were confirmed to have a single phase of C60 solid from the Raman scattering and optical absorption spectra as well as from the chromatography of benzene extract of the films. With increase of the laser energy fluence over 50 mJ/cm2, the deposited films included increasing amounts of photodecomposed components and, consequently, varying physical properties. Atomic force microscopy revealed atomically smooth surfaces of C60 thin films laser-deposited at laser energy fluences between 40 mJ/cm2 and 50 mJ/cm2. |
| Databáze: | OpenAIRE |
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