Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

Autor:	Edwin Kroke, Daniel Probst, A. Thissen, Erhard Broszeit, Ralf Hauser, Peter Kroll, Herbert Stafast, Holger Hoche, Yanping Zhou, Ralf Riedel
Rok vydání:	2006
Předmět:	Amorphous silicon Materials science Silicon Analytical chemistry chemistry.chemical_element Chemical vapor deposition Cathode law.invention Anode chemistry.chemical_compound chemistry Optical microscope Ellipsometry law Materials Chemistry Ceramics and Composites Carbon nitride
Zdroj:	Journal of the European Ceramic Society. 26:1325-1335
ISSN:	0955-2219
Popis:	Amorphous silicon carbon nitride (Si/C/N) coatings were prepared on steel substrates by RF plasma-enhanced chemical vapour deposition (RF-PECVD) from the single-source precursor bis(trimethylsilyl)carbodiimide (BTSC). The films were characterised by X-ray diffraction (XRD), ellipsometry, FTIR, glow discharge optical emission spectroscopy (GDOES), optical microscopy, AFM, hardness measurements, scratch-, tribological- and corrosion-tests. The results of these studies show that the coatings obtained on the RF-powered electrode (cathode) were black, thick (>20 μm) and hard (21–29 GPa), while those grown on the grounded electrode (anode) were yellow, thin (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::763162654d84dd3547051e1abaf0585e https://doi.org/10.1016/j.jeurceramsoc.2005.02.004 Zobrazit plný text záznamu Full Text from ScienceDirect