Picosecond Recombination of Photoexcited Carriers in Glow Discharge a-Si:H Films of Different Deposition Temperature

Autor: V. Brückner, W. Nowick, D. Dietrich, H. Bergner
Rok vydání: 1983
Předmět:
Zdroj: physica status solidi (b). 120:655-658
ISSN: 0370-1972
DOI: 10.1002/pssb.2221200222
Popis: The temporal behaviour is studied of photoexcited charge carriers in GD-a-Si: H in the ps range, the amorphous films are produced at different substrate temperatures up to 200°C. The recombination is characterized by a two-step relaxation process. The relaxation times are 32 to 165 ps and 0.75 to 1.4 ns, respectively. The sample prepared at 200°C shows a superposition of linear and bimolecular recombination. The recombination rate was found to be γ = 3,3 × 10−10 cm3 s−1.
Databáze: OpenAIRE