Picosecond Recombination of Photoexcited Carriers in Glow Discharge a-Si:H Films of Different Deposition Temperature
Autor: | V. Brückner, W. Nowick, D. Dietrich, H. Bergner |
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Rok vydání: | 1983 |
Předmět: | |
Zdroj: | physica status solidi (b). 120:655-658 |
ISSN: | 0370-1972 |
DOI: | 10.1002/pssb.2221200222 |
Popis: | The temporal behaviour is studied of photoexcited charge carriers in GD-a-Si: H in the ps range, the amorphous films are produced at different substrate temperatures up to 200°C. The recombination is characterized by a two-step relaxation process. The relaxation times are 32 to 165 ps and 0.75 to 1.4 ns, respectively. The sample prepared at 200°C shows a superposition of linear and bimolecular recombination. The recombination rate was found to be γ = 3,3 × 10−10 cm3 s−1. |
Databáze: | OpenAIRE |
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