Roughness characterization in positive and negative resists
| Autor: | Evangelos Gogolides, Evangelos Valamontes, Vassilios Constantoudis, Constantinos D. Diakoumakos, Angeliki Tserepi |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
business.industry Inverse Surface finish Condensed Matter Physics Molecular physics Fractal dimension Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Characterization (materials science) Optics Resist Electrical and Electronic Engineering LCOR business Root-mean-square deviation Scaling |
| Zdroj: | Microelectronic Engineering. :793-801 |
| ISSN: | 0167-9317 |
| Popis: | Different roughness parameters, such as the root mean square deviation (rms or σ), the correlation length Lcor, the fractal dimension D and the Fourier spectrum, are presented and compared. The scaling behavior of σ determining the Lcor as well as the dependence of σ and D on the exposure dose for two negative tone (wet- and plasma-developed) and one positive tone resist are investigated. The experimental analysis reveals an interesting interrelation (inverse behavior) between σ and D which is not predicted by theory, and elucidates the dependence of Lcor on the exposure dose. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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