Time-resolved electrical measurements of a pulsed-dc methane discharge used in diamond-like carbon films production
| Autor: | C. Corbella, Gerard Oncins, M.C. Polo, J.L. Andújar, Enric Bertran, Esther Pascual |
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| Rok vydání: | 2005 |
| Předmět: |
Glow discharge
Diamond-like carbon Plasma parameters Chemistry Metals and Alloys Pulsed DC Analytical chemistry Diamond Biasing Surfaces and Interfaces engineering.material Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid Materials Chemistry engineering Electrical measurements |
| Zdroj: | Thin Solid Films. 482:172-176 |
| ISSN: | 0040-6090 |
| Popis: | Amorphous hydrogenated carbon (a-C:H) thin films were obtained at room temperature via asymmetric bipolar pulsed-dc methane glow discharge. The power frequency values were varied from 100 to 200 kHz and the maximum amplitude voltage from −600 to −1400 V. Such films present diamond-like carbon (DLC) properties [J.L. Andujar, M. Vives, C. Corbella, E. Bertran, Diamond Relat. Mater. 12 (2003) 98]. The plasma, powered by a pulse frequency of 100 kHz, was electrically studied by a Langmuir probe. The next parameters were calculated within the pulse cycle from I–V measurements with 1 μs resolution: plasma and floating potentials, electron temperature, and electron and ion densities. The presence of a population of hot electrons (10 eV) was detected at high bias voltage region. The density of cold electrons grows one order of magnitude after each negative pulse, whereas the ion density suffers a prompt increase during each positive pulse. The surface topography of DLC films was scanned by atomic force microscopy (AFM). A smoothly varying friction coefficient (between 0.2 and 0.3) was measured by AFM in contact mode. X-ray reflectivity (XRR) analysis provided a wide characterization of the films, involving density, thickness and roughness. The C/H ratio, as directly obtained by elemental analysis (EA), shows an increase at higher bias voltages. All these features are discussed in terms of process parameters varied in film growth. |
| Databáze: | OpenAIRE |
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