On control of resist film uniformity in the microlithography process

Autor:	Weng Khuen Ho, Arthur Tay, Lay Lay Lee, Charles D. Schaper
Rok vydání:	2004
Předmět:	Control and Systems Engineering Applied Mathematics Electrical and Electronic Engineering Computer Science Applications
Zdroj:	Control Engineering Practice. 12:881-892
ISSN:	0967-0661
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::75f56440c732d294bfb98da0a8f95bc3 https://doi.org/10.1016/j.conengprac.2003.12.001 Zobrazit plný text záznamu Full Text from ScienceDirect