Fluid dynamic modelling and experimental diagnostics of an inductive high density plasma source (ICP)
| Autor: | P. Awakowicz, G. Wachutka, R. Schwefel, P. Scheubert |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Electron density
Materials science Synthetic diamond Surfaces and Interfaces General Chemistry Plasma Condensed Matter Physics Surfaces Coatings and Films law.invention symbols.namesake Physics::Plasma Physics law Electromagnetic coil Materials Chemistry symbols Langmuir probe Plasma diagnostics Process window Atomic physics Inductively coupled plasma |
| Zdroj: | Surface and Coatings Technology. :526-530 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/s0257-8972(01)01053-2 |
| Popis: | A planar inductively coupled plasma source (ICP) used for diamond deposition experiments was characterised theoretically as well as experimentally. In the typical process window (gas pressure 400 Pa) the discharge shows strong local variations of temperature and electron density. Especially, the homogeneity of the plasma in dependence of the process pressure and coil configurations was investigated. Langmuir probe measurements for noble gas discharges in a wide pressure range were compared with theoretical data from a reactor model. A 2D-fluid plasma model, coupled self-consistently with an electrodynamic model, was used to calculate the theoretical results. Experiment and simulation show very good agreement with a wide range of parameters. |
| Databáze: | OpenAIRE |
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