Current status of high-index immersion lithography development
| Autor: | Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Hiroyuki Nagasaka, Toshiharu Nakashima, Ayako Sukegawa, Yasuhiro Ohmura, Soichi Owa |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Materials science
business.industry Computational lithography Extreme ultraviolet lithography Hardware_PERFORMANCEANDRELIABILITY law.invention Lens (optics) Nanolithography law Hardware_INTEGRATEDCIRCUITS Optoelectronics Photolithography business Lithography Next-generation lithography Immersion lithography |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.711252 |
| Popis: | High index immersion lithography (HIL) is one candidate for the next generation lithography technology following water immersion lithography. This technology may require only moderate changes of chip making processes and result in lower cost of ownership (CoO) compared with other technologies such as double processing, extreme ultra violet lithography (EUVL), and nano-imprinting, and other technologies. In this paper, the current status of high index lens material and immersion fluid development compared with our requirements is discussed considering microlithographic lens design feasibility and attainable NA. |
| Databáze: | OpenAIRE |
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