The Effect of Laser Annealing on Laser-induced Damage Threshold

Autor:	D. C. Emmony, N. C. Kerr
Rok vydání:	1990
Předmět:	Materials science Excimer laser business.industry medicine.medical_treatment Laser Atomic and Molecular Physics and Optics law.invention Laser annealing Optics law medicine Surface roughness Optoelectronics business
Zdroj:	Journal of Modern Optics. 37:787-802
ISSN:	1362-3044 0950-0340
DOI:	10.1080/09500349014550851
Popis:	A significant enhancement of the single-shot laser-induced damage threshold of CaF2 and fused silica and a moderate enhancement for GaAs and Al has been observed as the result of laser annealing using an excimer laser operating at 248 nm. This phenomenon is primarily attributed to a reduction of the residual surface roughness of the samples.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::75954965bfc96e36d6b1e8aa284b349e https://doi.org/10.1080/09500349014550851 Zobrazit plný text záznamu