Autor:	Bifeng Xiong, Sihai Chen, Xinjian Yi, Hongchen Wang, Yingrui Wang
Rok vydání:	2002
Předmět:	Radiation Ion beam sputtering Materials science Silicon Infrared business.industry Vanadium chemistry.chemical_element Microbolometer Condensed Matter Physics Vanadium dioxide chemistry Optoelectronics Electrical and Electronic Engineering Thin film business Instrumentation
Zdroj:	International Journal of Infrared and Millimeter Waves. 23:1699-1704
ISSN:	0195-9271
DOI:	10.1023/a:1021450317818
Popis:	V02-based thin film materials on silicon substrates are fabricated by ion beam sputtering and a post-annealing which is different from the conventional fabricating method. An infrared linear microbolometer array with 128 pixels is prepared using as-deposited vanadium dioxide thin films. Optical and electrical properties for V02-based microbolometer array are tested.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::756f036459b93e9de3ad209a6f445a38 https://doi.org/10.1023/a:1021450317818 Zobrazit plný text záznamu Full text from SpringerLink