High-Density Groove Mastering Using an Electron Beam Recorder and Plasma Etching Process

Autor:	Hiroshi Nishiwaki, Takanori Mitsuhata, Tetsuya Iida, Hiroyasu Inoue, Akira Kouchiyama, Makoto Okano, Masahiro Katsumura
Rok vydání:	2002
Předmět:	Plasma etching Materials science Physics and Astronomy (miscellaneous) business.industry General Engineering General Physics and Astronomy law.invention Numerical aperture Lens (optics) Wavelength Optics law Cathode ray Bit-length business Optical disc Groove (engineering)
Zdroj:	Japanese Journal of Applied Physics. 41:1698-1703
ISSN:	1347-4065 0021-4922
Popis:	An electron beam recorder (EBR) has been confirmed to have high-resolution performance and we think it is a promising recorder to produce a master stamper for the next-generation high-density optical disks. Because the high-density groove recording disk requires a narrower track pitch, the improvement of the recording resolution of the mastering recorder is necessary. However, owing to electron scattering, fabricating a groove structure was difficult even when we use a finely controlled conventional EB mastering process. A plasma etching process is an expected process as one of the solutions. Consequently, we adopted the plasma etching process for high-density groove disk mastering. A data bit length of 112 nm/bit was successfully recorded on the groove disk at a wavelength of 405 nm and an objective lens of 0.85 numerical aperture.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::756c21aa2786123535ea4478c60c0e5a https://doi.org/10.1143/jjap.41.1698 Zobrazit plný text záznamu