Shallow nitrogen ion implantation: Evolution of chemical state and defect structure in titanium
| Autor: | A.K. Balamurugan, Varghese Anto Chirayath, Baldev Raj, P.A. Manojkumar, G. Amarendra, Mohammed Kamruddin, Nanda Gopala Krishna, S. Ilango, A.K. Tyagi |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Nuclear and High Energy Physics Chemistry Analytical chemistry chemistry.chemical_element 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Plasma-immersion ion implantation Positron annihilation spectroscopy Secondary ion mass spectrometry Chemical state Ion implantation X-ray photoelectron spectroscopy 0103 physical sciences 0210 nano-technology Spectroscopy Instrumentation Titanium |
| Zdroj: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 383:6-13 |
| ISSN: | 0168-583X |
| DOI: | 10.1016/j.nimb.2016.06.002 |
| Popis: | Evolution of chemical states and defect structure in titanium during low energy nitrogen ion implantation by Plasma Immersion Ion Implantation (PIII) process is studied. The underlying process of chemical state evolution is investigated using secondary ion mass spectrometry and X-ray photoelectron spectroscopy. The implantation induced defect structure evolution as a function of dose is elucidated using variable energy positron annihilation Doppler broadening spectroscopy (PAS) and the results were corroborated with chemical state. Formation of 3 layers of defect state was modeled to fit PAS results. |
| Databáze: | OpenAIRE |
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