Graphite thin film formation by chemical vapor deposition
Autor: | Masako Yudasaka, Rie Kikuchi, Etsuro Ota, Hiroaki Kamo, T. Matsui, Yoshimasa Ohki, Susumu Yoshimura |
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Rok vydání: | 1994 |
Předmět: | |
Zdroj: | Applied Physics Letters. 64:842-844 |
ISSN: | 1077-3118 0003-6951 |
DOI: | 10.1063/1.110998 |
Popis: | Well‐ordered graphite thin films were obtained by chemical vapor deposition of 2‐methyl‐ 1,2’‐naphthyl ketone on Ni substrates at substrate temperatures higher than 600 °C. Values of interlayer spacing calculated from x‐ray diffraction data were between 3.360 and 3.350 A. Raman scattering spectra of the films showed a peak centering at 1580 cm−1. |
Databáze: | OpenAIRE |
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