Deposition of palladium nanoparticles on the silicon surface via galvanic replacement in DMSO
| Autor: | Mariana Shepida, Egor Kaniukov, Orest Kuntyi, Galyna Zozulya |
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| Rok vydání: | 2019 |
| Předmět: |
inorganic chemicals
Materials science Silicon Precipitation (chemistry) Materials Science (miscellaneous) Metal ions in aqueous solution Nucleation Nanochemistry chemistry.chemical_element Nanoparticle 02 engineering and technology Cell Biology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics 0104 chemical sciences Chemical engineering chemistry Galvanic cell Electrical and Electronic Engineering Physical and Theoretical Chemistry 0210 nano-technology Biotechnology Palladium |
| Zdroj: | Applied Nanoscience. 10:2563-2568 |
| ISSN: | 2190-5517 2190-5509 |
| Popis: | The palladium deposition on the silicon surface has been investigated by the method of galvanic replacement in a solution of dimethyl sulfoxide. When activating by fluoride ions the spherical metal nanoparticles and their agglomerates with uniform distribution over the substrate surface are formed. The main factors influencing the geometry of nanoparticles are the palladium ions concentration, temperature and deposition time. It has been established that the concentration of reducible metal ions in the range of 1–2 mM l−1 provides the precipitation of palladium nanoparticles with the sizes up to 100 nm. The increase in temperature from 30 to 50 °C essentially increases the galvanic replacement rate, resulting in the increase of the nanoparticles size and the formation of agglomerates. The increase in replacement time leads to the enlargement of nanoparticles size without an increase in their number, indicating that the nucleation occurs predominantly in the initial period of this process. |
| Databáze: | OpenAIRE |
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