Autor: |
Yasufumi Fujiwara, T. Hirata, Y. Yang, Y. Isogai, Arao Nakamura, N. Watanabe, Yoshikazu Takeda, S. Jinno, T. Kuno, T. Akane |
Rok vydání: |
2003 |
Předmět: |
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Zdroj: |
Materials Science in Semiconductor Processing. 6:461-464 |
ISSN: |
1369-8001 |
DOI: |
10.1016/j.mssp.2003.07.031 |
Popis: |
ErP has been grown on InP (0 0 1), (1 1 1)A and (1 1 1)B substrates by low-pressure organometallic vapor-phase epitaxy. The morphological change with growth temperature has been explored by atomic force microscope. On all the substrates, ErP is grown in island structure. Height and area size of the ErP islands on (1 1 1)A substrate exhibit an obvious dependence on growth temperature. ErP islands grown at 540°C, that is the suitable temperature for ErP formation, gather to step edges to make wires. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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