dc cathodic polymerization of trimethylsilane in a closed reactor system
| Autor: | Hirotsugu Yasuda, C. E. Moffitt, D. M. Wieliczka, Qingsong Yu |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
chemistry.chemical_classification
Silicon Residual gas analyzer technology industry and agriculture Analytical chemistry chemistry.chemical_element Trimethylsilane Surfaces and Interfaces Polymer Plasma Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound chemistry Polymerization Plasma-enhanced chemical vapor deposition Deposition (chemistry) |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:2163-2167 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.1378078 |
| Popis: | dc cathodic polymerization of trimethylsilane (TMS) in a closed reactor system was investigated. The composition of reactive species in the gas phase was monitored during the deposition process by a residual gas analyzer. It was found that, in such a closed plasma system, the deposition of TMS plasma polymers could be visualized as three consecutive, time-delayed, consecutive three fundamental processes. In the early stage of plasma deposition ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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