Molecular Level Study of Negative Thick-Film Resist in MEMS by Employing a Coarse-Grained Molecular Dynamics Simulation

Autor:	Akio Uesugi, Koji Sugano, Hiromasa Yagyu, Yoshihide Makino, Osamu Tabata, Toshiyuki Tsuchiya, Yoshikazu Hirai
Rok vydání:	2013
Předmět:	Microelectromechanical systems Molecular dynamics Molecular level Materials science Resist Mechanical Engineering Nanotechnology Electrical and Electronic Engineering
Zdroj:	IEEJ Transactions on Sensors and Micromachines. 133:320-329
ISSN:	1347-5525 1341-8939
DOI:	10.1541/ieejsmas.133.320
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::741a752010d7e8917ea9746f5b38e25f https://doi.org/10.1541/ieejsmas.133.320 Zobrazit plný text záznamu