Characterization of a methyl radical source for ultrahigh vacuum thin film growth studies

Autor:	John Lannon, V.L. Tolani, J. S. Gold, M. Guntu, Katherine S. Ziemer, C. D. Stinespring
Rok vydání:	2006
Předmět:	Argon Materials science Radical Analytical chemistry Methyl radical chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Mass spectrometry Methane Surfaces Coatings and Films chemistry.chemical_compound Vacuum deposition chemistry Thin film Molecular beam
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:1044-1050
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.2209655
Popis:	An ultrahigh vacuum compatible methyl radical source has been developed and characterized. The methyl radicals were generated by passing a dilute mixture of methane in argon through a microwave discharge and sampling the discharge products using a molecular beam skimmer. The resulting molecular beam was characterized using a differentially pumped mass spectrometer. In addition to methyl radicals, other species observed in the beam included methane and higher hydrocarbons whose relative amounts were affected by source operating conditions. Radical fluxes as high as 8.4×1014cm−2s−1 were produced.
Databáze:	OpenAIRE
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