Nanofabrication of low extinction coefficient and high-aspect-ratio Si structures for metaphotonic applications
| Autor: | Chang Seung Lee, Heejeong Jeong, Chang-Won Lee, Yongsung Kim, Jaekwan Kim, Chan-Wook Baik, Jeong-yub Lee, Seung-hoon Han, Byong-Gwon Song |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Annealing (metallurgy) business.industry High-refractive-index polymer Flat lens 02 engineering and technology Dielectric Molar absorptivity 021001 nanoscience & nanotechnology 01 natural sciences Wavelength Nanolithography Optics 0103 physical sciences Optoelectronics 0210 nano-technology business Visible spectrum |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2235523 |
| Popis: | We investigated forming of high refractive index (n), low extinction coefficient (k) of Si dielectrics in visible wavelength ranges. To decrease k, pulsed green laser annealing (GLA) with line beam of a 532-nm wavelength was applied in this study for homogeneous melting. By AFM, XRD and TEM analysis, we examined the defect reduction in various conditions during poly-crystallization. We achieved dielectric nanostructures having optical properties of n>4.2, k |
| Databáze: | OpenAIRE |
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