| Popis: |
In recent years, micro and nanotechnology have undergone a rapid development due to their applications in different scientific areas such as metaphotonics, an emerging branch of optics that studies the interaction of light with micro and nanostructured metamaterials. Our particular interest is the development of integrated metaphotonic devices for lab-on-a-chip biosensing applications. A widely used technique for the manufacture of integrated optical devices is photolithography, which is based on the processing of UV-light-sensitive photoresists to create masks for the deposition of thin films and generate the desired devices. In this contribution, we present an experimental methodology for the patterning of plasmonic waveguides using a photolithography system for printing SU-8 photoresist masks on glass substrates. We show the necessary parameters to optimize the photoresist printing (beam waist, focal distance and fluence) under normal conditions and the characterization of the samples through atomic force microscopy. Due to the aspect ratio between the width of the waveguides and thickness of the photoresist, the obtained results approach us to the development of multilayered systems for new integrated metaphotonic devices. |
