Reduced water vapor transmission rates of low-temperature solution-processed metal oxide barrier films via ultraviolet annealing
Autor: | Sooji Nam, Jaeyoung Jang, Yonghwa Baek, Seonuk Park, Chan Eon Park, Tae Kyu An, Yebyeol Kim, Yong Jin Jeong, Se Hyun Kim, Jin Hyuk Jang, Lae Ho Kim |
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Rok vydání: | 2017 |
Předmět: |
Materials science
Annealing (metallurgy) Oxide Analytical chemistry General Physics and Astronomy 02 engineering and technology Surfaces and Interfaces General Chemistry 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics medicine.disease_cause 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films chemistry.chemical_compound chemistry medicine Relative humidity Thin film 0210 nano-technology Polyethylene naphthalate Water vapor Ultraviolet Polyimide |
Zdroj: | Applied Surface Science. 414:262-269 |
ISSN: | 0169-4332 |
Popis: | Here, we report the fabrication of low-temperature sol-gel-derived aluminum oxide (AlO x ) films via ultraviolet (UV) annealing and the investigation of their water vapor blocking properties by measuring the water vapor transmission rates (WVTRs). The UV annealing process induced the formation of a dense metal-oxygen-metal bond (Al-O-Al structure) at low temperatures ( x thin film at 180 °C was comparable to that of AlO x thin films that have been thermally annealed at 350 °C. Furthermore, the UV-annealed AlO x thin films exhibited a high optical transparency in the visible region (>99%) and good electrical insulating properties (∼10 −7 A/cm 2 at 2 MV/cm). Finally, we confirmed that a dense AlO x thin film was successfully deposited onto the plastic substrate via UV annealing at low temperatures, leading to a substantial reduction in the WVTRs. The Ca corrosion test was used to measure the WVTRs of AlO x thin films deposited onto polyethylene naphthalate or polyimide substrates, determined to be 0.0095 g m −2 day −1 (25 °C, 50% relative humidity) and 0.26 g m −2 day −1 , respectively. |
Databáze: | OpenAIRE |
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