Reduced water vapor transmission rates of low-temperature solution-processed metal oxide barrier films via ultraviolet annealing

Autor: Sooji Nam, Jaeyoung Jang, Yonghwa Baek, Seonuk Park, Chan Eon Park, Tae Kyu An, Yebyeol Kim, Yong Jin Jeong, Se Hyun Kim, Jin Hyuk Jang, Lae Ho Kim
Rok vydání: 2017
Předmět:
Zdroj: Applied Surface Science. 414:262-269
ISSN: 0169-4332
Popis: Here, we report the fabrication of low-temperature sol-gel-derived aluminum oxide (AlO x ) films via ultraviolet (UV) annealing and the investigation of their water vapor blocking properties by measuring the water vapor transmission rates (WVTRs). The UV annealing process induced the formation of a dense metal-oxygen-metal bond (Al-O-Al structure) at low temperatures ( x thin film at 180 °C was comparable to that of AlO x thin films that have been thermally annealed at 350 °C. Furthermore, the UV-annealed AlO x thin films exhibited a high optical transparency in the visible region (>99%) and good electrical insulating properties (∼10 −7 A/cm 2 at 2 MV/cm). Finally, we confirmed that a dense AlO x thin film was successfully deposited onto the plastic substrate via UV annealing at low temperatures, leading to a substantial reduction in the WVTRs. The Ca corrosion test was used to measure the WVTRs of AlO x thin films deposited onto polyethylene naphthalate or polyimide substrates, determined to be 0.0095 g m −2 day −1 (25 °C, 50% relative humidity) and 0.26 g m −2 day −1 , respectively.
Databáze: OpenAIRE