CHEMICAL STRUCTURE AND FUNCTIONAL PROPERTIES OF AMORPHOUS BORON CARBONITRIDE FILMS

Autor:	Andrey A. Saraev, D. I. Rogilo, Rong Tu, Nitu Bhaskar, I. V. Yushina, A. A. Shapovalova, Maxim Khomyakov, V. S. Sulyaeva, A. K. Kozhevnikov, V. R. Shayapov, Marina Kosinova, E. Ya. Gatapova
Rok vydání:	2021
Předmět:	Materials science Argon Band gap chemistry.chemical_element Substrate (electronics) Surface finish Surface energy Inorganic Chemistry Contact angle Chemical engineering chemistry Sputtering Materials Chemistry Deposition (phase transition) Physical and Theoretical Chemistry
Zdroj:	Journal of Structural Chemistry. 62:1309-1324
ISSN:	1573-8779 0022-4766
DOI:	10.1134/s0022476621080187
Popis:	We report a comprehensive study of the effect of the chemical structure of boron carbonitride films on the variability of their functional characteristics. The BCxNy films are prepared on Si(100) and fused silica substrates by reactive magnetron sputtering of a B4C target in an argon/nitrogen mixture. The deposition rate, elemental composition, and types of chemical bonds in the films is studied depending on the nitrogen content in the gas mixture. Optical (refractive index, transmission coefficient, band gap) and mechanical (hardness, Young′s modulus, substrate adhesion) characteristics are investigated depending on the deposition parameters and the chemical structure of the films. Particular attention is paid to the surface properties of the BCxNy films (morphology, roughness, contact angle, and surface free energy). Stability of the BCxNy films upon storage in air is studied for the first time. The data obtained for the composition, structural characteristics, and some functional properties of the BCxNy films are compared with those reported in literature.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::73680e08f428cece3e8e7fc26f832826 https://doi.org/10.1134/s0022476621080187 Zobrazit plný text záznamu Plný text ve formátu PDF