Dopant Segregated Schottky Source/Drain for Germanium p-MOSFETs with Metal Gate/High-k Dielectric Stack
| Autor: | Phyllis S. Lim, Dong Zhi Chi, Guo Qiang Lo, Yee-Chia Yeo |
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| Rok vydání: | 2009 |
| Zdroj: | ECS Meeting Abstracts. :2395-2395 |
| ISSN: | 2151-2043 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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