Study of the Interplay Between Dry Etch and Wet Clean in Patterning La2O3/HfO2 Containing High-k/Metal Gate Stacks
| Autor: | Ingrid Vos, David Hellin, Christa Vrancken, Guglielma Vecchio, Vasile Paraschiv, Johan Vertommen, Werner Boullart |
|---|---|
| Rok vydání: | 2009 |
| Zdroj: | ECS Meeting Abstracts. :2056-2056 |
| ISSN: | 2151-2043 |
| DOI: | 10.1149/ma2009-02/24/2056 |
| Popis: | not Available. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|