Dose control strategy using random logic device patterns and massive metrology in a foundry high volume manufacturing environment

Autor: Kan Zhou, Xin Guo, Yuyang Bian, Wenzhan Zhou, Yu Zhang, Ijen van Mil, Elly Shi, Robbin Zhu, Jo Zhu, Ivan Mao, Elvira Koolen, Kaiyuan Chi, Jose Carlos Font Trinchant, Gratiela Isai, Selena Chen, Jing Wang, Pei Wang, Shane Su, Xuechen Zhu, Kolos Lin, Kelvin Pao, Koen Thuijs, Peja Lee, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Andy Zhang, Leon Liang, Xander Wang, Gary Zhang
Rok vydání: 2021
Zdroj: 2021 International Workshop on Advanced Patterning Solutions (IWAPS).
DOI: 10.1109/iwaps54037.2021.9671240
Databáze: OpenAIRE