Plasma chemistry in disilane discharges
| Autor: | D. A. Doughty, Alan Gallagher, J. R. Doyle |
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| Rok vydání: | 1992 |
| Předmět: | |
| Zdroj: | Journal of Applied Physics. 71:4771-4780 |
| ISSN: | 1089-7550 0021-8979 |
| DOI: | 10.1063/1.350669 |
| Popis: | We have measured the initial silane and polysilane product yields from disilane decomposition in rf and dc discharges, at 25 and 250 °C and 20 Pa (0.15 Torr) pressure as typically used for a‐Si:H film deposition. From analyses of these yields we conclude that the initial Si2H6 fragmentation pattern is SiH3+SiH2+H (91±9%) and H3SiSiH+2H (9±9%), that the primary product of the H+Si2H6 reaction is SiH4+SiH3, and that SiH3 is the dominant radical causing film growth. We have measured a radical‐surface reaction probability of 0.34±0.03, very similar to that observed for SiH3 in SiH4 discharges. We report a spatial distribution of emission indicative of a γ‐regime discharge. From deposition on glass fibers strung between the electrodes, we find that highly strained a‐Si:H film is produced everywhere except on or near the electrodes, suggesting that energetic ion impact is necessary to yield useful films in disilane discharges. |
| Databáze: | OpenAIRE |
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